MIM precision structural parts are based on high-precision molding, with surface modification technology as the core of end performance. The key to PVD surface technology is exactly the core material we are going to break down — PVD targets.
I. Core Definition of PVD Targets
PVD targets are the sputtering source materials bombarded by high-energy ions during the Physical Vapor Deposition (PVD) process. The atoms or molecules sputtered from the targets can be uniformly deposited on the surface of complex curved surfaces and deep-hole structures of MIM workpieces, forming functional films with specific properties such as wear resistance, corrosion resistance, biocompatibility and decorative appearance. They are the core raw material of the entire coating process.
II. Mainstream Target Categories & Applicable Scenarios in the MIM Field
1. Elemental Metal Targets
The most widely used basic category in the industry, represented by titanium, chromium, aluminum, copper, etc. Among them, the TiN film prepared by titanium targets has excellent biocompatibility, making it the core choice for medical devices and implantable MIM parts; the film made of chromium targets has outstanding corrosion resistance, which is widely used in MIM structural parts for general industry and locks.
2. Alloy Targets
Made of two or more metal elements with customized ratios, represented by titanium aluminum, chromium aluminum, nickel chromium, etc. Compared with elemental targets, the films prepared have significantly improved high temperature resistance, oxidation resistance and fatigue resistance, which are perfectly suitable for MIM precision parts used in harsh working conditions such as automotive electronics, new energy and 5G communications.
3. Compound Ceramic Targets
Represented by titanium carbide, chromium nitride, molybdenum disulfide, etc. They can be used to prepare functional films with higher hardness, while achieving customized optical and electrical properties and appearance effects. They are mostly used in MIM precision structural parts for high-end consumer electronics and semiconductor-related fields.
III. Core Evaluation Criteria for Target Selection
- Purity and Density: Directly affect particle defects and pinhole defects in the coating process, and determine the surface yield and mass production cost of MIM parts
- Grain Size and Uniformity: Determine the stability of the sputtering rate, ensure the film uniformity of MIM parts with complex cavities and deep-hole structures, and will not damage the original high-precision tolerance of the parts
- Batch Consistency: The core bottom line to ensure stable process, controllable yield and smooth delivery in the mass production of MIM parts
As a one-stop precision MIM OEM service provider, Yibi Precision has a full-chain in-house production line covering mold development, precision molding, post-sintering treatment, customized surface treatment and full-dimensional inspection. We can provide end-to-end closed-loop delivery solutions for MIM precision parts from drawings to finished products.
If you have customized project requirements for MIM precision parts, please feel free to contact us via private message.